Chemical Vapor Deposition


Subject: Chemical Vapor Deposition
Date: Sun, 8 Apr 2001 14:25:49 -0400 (EDT)

Chemical Vapor Deposition

ISSN: 1521-3862

Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications and
Full Papers on all aspects of chemical
vapor deposition and related technologies, along with other articles
presenting opinion, news, conference information and book reviews. Chemists,
physicists and engineers whose publications on chemical vapor deposition
have in the past been spread over journals covering inorganic chemistry,
materials chemistry, organometallics, applied physics and semiconductor
technology, thin films and ceramic processing now have a unified forum for
their work.

Available by subscription only.


Editor: Michael L. Hitchman

Original posting date: 
Sunday, May 6, 2001
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